Title:CMP pad conditioners with mosaic abrasive segments and associated methods
United States Patent 8398466
Sung, Chien-min (Tansui, TW)
Sung, Michael (San Francisco, CA, US)
A CMP pad conditioner comprises a plurality of abrasive segments. Each abrasive segment includes a segment blank and an abrasive layer attached to the segment blank, the abrasive layer including a superhard abrasive material. A pad conditioner substrate is also provided. Each of the plurality of abrasive segments is permanently affixed to the pad conditioner substrate in an orientation that enables removal of material from a CMP pad by the abrasive layer as the pad conditioner and the CMP pad are moved relative to one another.